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Title: Two-photon interferometry for high-resolution imaging
Authors: Strekalov, Dmitry
Dowling, Jonathan
Keywords: nanolithography
quantum technology
Issue Date: 7-Jan-2001
Publisher: Pasadena, CA : Jet Propulsion Laboratory, National Aeronautics and Space Administration, 2001.
Citation: Physics of Quantum Electronics, Snowbird, Utah, January 7-11, 2001.
Abstract: We discuss advantages of using non-classical states of light for two aspects of optical imaging: creating of miniature images on photosensitive substrates, which constitutes the foundation for optical lithography, and conversely, imaging of micro objects. In both cases, the classical resolution limit given by the Rayleigh criterion is approximately a half of the optical wavelength. It has been shown, however, that by using multi-photon quantum states of the light field, and multi-photon sensitive material or detector, this limit can be surpassed. In the present work, we give a rigorous quantum mechanical treatment of this problem, address some particularly widespread misconceptions and discuss the requirements arising on the way of turning the research on quantum imaging into a practical technology
Appears in Collections:JPL TRS 1992+

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