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Please use this identifier to cite or link to this item:
http://hdl.handle.net/2014/37280
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| Title: | A nanochannel fabrication technique using chemical-mechanical polishing (CMP) and thermal oxidation |
| Authors: | Lee, C.
Yang, E. H.
Myung, N. V.
George, T. |
| Issue Date: | 12-Aug-2003 |
| Citation: | IEEE NANO Conference 2003
San Francisco, CA, USA |
| Abstract: | We have developed a new nanochannel fabrication technique using chemical-mechanical polishing (CMP) and thermal oxidation. With this technique, it is possible to control the width, length, and depth of the nanochannels without the need for nanolithography. |
| URI: | http://hdl.handle.net/2014/37280 |
| Appears in Collections: | JPL TRS 1992+
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