BEACON eSpace at Jet Propulsion Laboratory >
JPL Technical Report Server >
JPL TRS 1992+ >
Please use this identifier to cite or link to this item:
|Title: ||A nanochannel fabrication technique using chemical-mechanical polishing (CMP) and thermal oxidation|
|Authors: ||Lee, C.|
Yang, E. H.
Myung, N. V.
|Issue Date: ||12-Aug-2003 |
|Citation: ||IEEE NANO Conference 2003|
San Francisco, CA, USA
|Abstract: ||We have developed a new nanochannel fabrication technique using chemical-mechanical polishing (CMP) and thermal oxidation. With this technique, it is possible to control the width, length, and depth of the nanochannels without the need for nanolithography.|
|Appears in Collections:||JPL TRS 1992+|
Items in DSpace are protected by copyright, but are furnished with U.S. government purpose use rights.