NASA Jet Propulsion Laboratory California Institute of Technology Follow this link to skip to the main content

BEACON eSpace at Jet Propulsion Laboratory >
JPL Technical Report Server >
JPL TRS 1992+ >

Please use this identifier to cite or link to this item: http://hdl.handle.net/2014/37280

Title: A nanochannel fabrication technique using chemical-mechanical polishing (CMP) and thermal oxidation
Authors: Lee, C.
Yang, E. H.
Myung, N. V.
George, T.
Issue Date: 12-Aug-2003
Citation: IEEE NANO Conference 2003
San Francisco, CA, USA
Abstract: We have developed a new nanochannel fabrication technique using chemical-mechanical polishing (CMP) and thermal oxidation. With this technique, it is possible to control the width, length, and depth of the nanochannels without the need for nanolithography.
URI: http://hdl.handle.net/2014/37280
Appears in Collections:JPL TRS 1992+

Files in This Item:

File SizeFormat
03-1467.pdf3.94 MBAdobe PDFView/Open

Items in DSpace are protected by copyright, but are furnished with U.S. government purpose use rights.

 

Privacy/Copyright Image Policy Beacon Home Contact Us
NASA Home Page + Div 27
+ JPL Space
Site last updated on December 5, 2014.
If you have any comments or suggestions for this web site, please e-mail Robert Powers.