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Please use this identifier to cite or link to this item:
http://hdl.handle.net/2014/35710
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| Title: | Ballistic-Electron-Emission Microscopy Techniques for Nanometer-scale Characterization of Interfaces |
| Authors: | Bell, L.D.
Grunthaner, F.J.
Hecht, M.H.
Manion, S.J.
Milliken, A.M.
Kaiser, W.J. |
| Issue Date: | 1993 |
| Citation: | Encyclopedia of Advanced Materials |
| Abstract: | Semiconductor interface properties are among the most important phenomena in materials science and technology. The study of metal/semiconductor Schottky barrier interfaces has been the primary focus of a large research and development community for decades. Throughout the long history of interface investigation, the study of interface defect electronic properties have been seriously hindered by the fundamental experimental difficulty of probing subsurface structures. A new method, Ballistic-Electron-Emission Microscopy (BEEM), has been developed which not only enables spectroscopic probing of subsurface interface properties, but also, provides nanometer-resolution imaging capabilities. BEEM employs Scanning Tunneling Microscopy (STM) and a unique spatially localized ballistic electron spectroscopy method... |
| URI: | http://hdl.handle.net/2014/35710 |
| Appears in Collections: | JPL TRS 1992+
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