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Title: Proximity Effect Corrected Phase Holograms in PMMA
Authors: Maker, P.
Muller, R.
Issue Date: 1-Jun-1993
Citation: EIPB-93
San Diego, California, USA
Abstract: Computer generated phase holograms have been fabricated by E-Beam lithography in PMMA using patterned exposure and subsequent partial development.
Appears in Collections:JPL TRS 1992+

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