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Please use this identifier to cite or link to this item:
http://hdl.handle.net/2014/34811
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| Title: | Proximity Effect Corrected Phase Holograms in PMMA |
| Authors: | Maker, P.
Muller, R. |
| Issue Date: | 1-Jun-1993 |
| Citation: | EIPB-93
San Diego, California, USA |
| Abstract: | Computer generated phase holograms have been fabricated by E-Beam lithography in PMMA using patterned exposure and subsequent partial development. |
| URI: | http://hdl.handle.net/2014/34811 |
| Appears in Collections: | JPL TRS 1992+
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