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Title: Thin Film Electrodes with an Integral Current Collection Grid for Use with Solid Electrolytes
Authors: Ryan, M.A.
Kisor, A.
Williams, R.M.
Jeffries-Nakamura, B.
O'Connor, D.
Issue Date: 23-May-1994
Citation: San Francisco, CA
Abstract: Thin film, high performance electrodes which can operate in high temperature environments are necessary for many devices which use a solid electrolyte. Electrodes of rhodium-tungsten alloy have been deposited on solid electrolyte using photolytic chemical vapor deposition (PCVD). A technique for depositing electrodes and current collection grids simultaneously has been developed using the prenucleation characteristics of PCVD. This technique makes it possible to fabricate electrodes which allow vapor transport through the thin (<1 ┬Ám) portions of the electrode while integral thick grid lines improve the electronic conductivity of the electrode, thus improving overall performance.
Appears in Collections:JPL TRS 1992+

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