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Please use this identifier to cite or link to this item:
http://hdl.handle.net/2014/32262
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| Title: | Fine Pitch Grids for an X-Ray Solar Imaging Spectrometer Fabricated by Optical Lithography and XeF2 Etching |
| Authors: | Brennen, R. Hecht, M. Wiberg, D. Manion, S. Bonivert, W. Hruby, J. Pister, K. Kruglick, E. |
| Issue Date: | 1995 |
| Citation: | SPIE Micromaching and Microfabrication 95 Austin, TX |
| Abstract: | Fine-pitch, sub-collimating X-ray grids have been developed for an instrument in the High Energy Solar Spectroscopic Imager , a proposed NASA mission. In addition to high-energy x- rays, the instrument requires collimation of photons with energies of less than 4 keV such that free-standing grids are required that have no material between the grid slats. Fabrication of these grids is described. |
| URI: | http://hdl.handle.net/2014/32262 |
| Appears in Collections: | JPL TRS 1992+
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