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Title: Hydrogen Effects on GaAs, Status and Progress
Authors: Kayali, Sammy
Issue Date: Aug-1995
Citation: San Diego, California
Abstract: It has been observed that GaAs devices in hermetically sealed packages when exposed to temperatures as low as 125øC can exhibit unacceptable degradation in both RF and DC characteristics. The source of the problem was found to be hydrogen that has been absorbed in the package's metals (Kovar, plating, etc.) and converted into atomic hydrogen within the Pt metallization of the gate structure. Subsequently, atomic hydrogen diffuses into the channel region of the FET structure and neutralizes the Si donors, resulting in a degradation of the device characteristics. Most of the data indicates the onslaught of the problem to occur after 500 hours at 125øC. This onslaught has been observed to be dependent on the thickness and processing conditions of the passivation layer, the sealing environment, and the amount of Pt or Pd in the gate structure of the device.
Appears in Collections:JPL TRS 1992+

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