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|Title: ||Microfabrication Ion Acceleration Grid Design Issues: Electronic Breakdown Characteristics of Silicon Dioxide Insulator Material|
|Authors: ||Mueller, J.|
|Issue Date: ||13-Jul-1998 |
|Citation: ||MTG: Joint Propulsion Conference|
Cleveland, OH, U.S.A.
|Abstract: ||Low-temperature (LTO) chemical vapor deposited (CVD) silicon dioxide was investigated for use as an insulator matierial in microfabriacted ion engine accelerator grids.|
|Appears in Collections:||JPL TRS 1992+|
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