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Please use this identifier to cite or link to this item: http://hdl.handle.net/2014/19472

Title: Fabrication of Diamond Membranes for MEMS using Reactive Ion Etching of Silicon
Authors: Ramesham, R.
Ellis, C. D.
Olivas, J. D.
Bolin, S.
Issue Date: Apr-1998
Citation: Thin Solid Films
USA
Abstract: Polycrystalline diamond thin film has been grown on a silicon substrate using high pressure microwave plasma-assisted chemical vapor deposition from a gas mixture of methane and hydrogen at a substrate temperature of 950 degrees celcius.
URI: http://hdl.handle.net/2014/19472
Appears in Collections:JPL TRS 1992+

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