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Please use this identifier to cite or link to this item:
http://hdl.handle.net/2014/19472
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| Title: | Fabrication of Diamond Membranes for MEMS using Reactive Ion Etching of Silicon |
| Authors: | Ramesham, R.
Ellis, C. D.
Olivas, J. D.
Bolin, S. |
| Issue Date: | Apr-1998 |
| Citation: | Thin Solid Films
USA |
| Abstract: | Polycrystalline diamond thin film has been grown on a silicon substrate using high pressure microwave plasma-assisted chemical vapor deposition from a gas mixture of methane and hydrogen at a substrate temperature of 950 degrees celcius. |
| URI: | http://hdl.handle.net/2014/19472 |
| Appears in Collections: | JPL TRS 1992+
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