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Please use this identifier to cite or link to this item:
http://hdl.handle.net/2014/19044
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| Title: | Taguchi Method Applied in Optimization of Shipley SJR 5740 Positive Resist Deposition |
| Authors: | Hui, A.
Blosiu, J. O.
Wiberg, D. V. |
| Issue Date: | 23-Feb-1998 |
| Citation: | SPIE, International Society of Optical Engineering
Santa Clara, California, USA |
| Abstract: | Taguchi Methods of Robust Design presents a way to optimize output process performance through an organized set of experiments by using orthogonal arrays. Analysis of variance and signal-to-noise ratio is used to evaluate the contribution of each of the process controllable parameters in the realization of the process optimization. In the photoresist deposition process, there are numerous controllable parameters that can affect the surface quality and thickness of the final photoresist layer. |
| URI: | http://hdl.handle.net/2014/19044 |
| Appears in Collections: | JPL TRS 1992+
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