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Please use this identifier to cite or link to this item: http://hdl.handle.net/2014/18998

Title: X-Ray Exposure of Electron-Deposited Photoresist for Conformal Lithography on Corrugated Surfaces
Authors: Hartley, F.
Malek, C.
Nguyen, S.
Issue Date: 22-Feb-1998
Citation: SPIE, Emerging Lithographic Technologies
Santa Clara, California, USA
Abstract: Proximity printing using synchrotron X-ray lithography provides high resolution pattern transfer with large depth of field, low diffraction effects and no reflection from the substrate. Electro-plating of photo-resist allows deposition of thin, uniform films over geometrically complex and topographically diverse, electrically conductive surfaces.
URI: http://hdl.handle.net/2014/18998
Appears in Collections:JPL TRS 1992+

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