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Please use this identifier to cite or link to this item:
http://hdl.handle.net/2014/18998
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| Title: | X-Ray Exposure of Electron-Deposited Photoresist for Conformal Lithography on Corrugated Surfaces |
| Authors: | Hartley, F.
Malek, C.
Nguyen, S. |
| Issue Date: | 22-Feb-1998 |
| Citation: | SPIE, Emerging Lithographic Technologies
Santa Clara, California, USA |
| Abstract: | Proximity printing using synchrotron X-ray lithography provides high resolution pattern transfer with large depth of field, low diffraction effects and no reflection from the substrate. Electro-plating of photo-resist allows deposition of thin, uniform films over geometrically complex and topographically diverse, electrically conductive surfaces. |
| URI: | http://hdl.handle.net/2014/18998 |
| Appears in Collections: | JPL TRS 1992+
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