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Please use this identifier to cite or link to this item:
http://hdl.handle.net/2014/18203
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| Title: | Nanometer X-ray Lithography |
| Authors: | Hartley, F.
Malek, C. |
| Issue Date: | 29-Oct-1999 |
| Citation: | Design, Characterization and Packaging for MEMs and Micro Electronics
Brisbane, Australia |
| Abstract: | New developments for X-ray nanomachinging include pattern transfer onto non-planar surfaces coated with eletrodeposited resists using synchrotron radion X-rays through extremely high-resolution masks made by chemically assisted focused ion beam lithography. |
| URI: | http://hdl.handle.net/2014/18203 |
| Appears in Collections: | JPL TRS 1992+
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