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Title: Nanometer X-ray Lithography
Authors: Hartley, F.
Malek, C.
Issue Date: 29-Oct-1999
Citation: Design, Characterization and Packaging for MEMs and Micro Electronics
Brisbane, Australia
Abstract: New developments for X-ray nanomachinging include pattern transfer onto non-planar surfaces coated with eletrodeposited resists using synchrotron radion X-rays through extremely high-resolution masks made by chemically assisted focused ion beam lithography.
Appears in Collections:JPL TRS 1992+

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