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Please use this identifier to cite or link to this item:
http://hdl.handle.net/2014/11093
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| Title: | A CMOS-compatible process technique for fabricating laterally embedded multi-nanaochannels without sacrificial etching |
| Authors: | Yang, E.
Lee, C.
Myung, N.
George, T. |
| Issue Date: | 8-Jun-2003 |
| Citation: | IEEE Transducers 03
Boston, MA, USA |
| URI: | http://hdl.handle.net/2014/11093 |
| Appears in Collections: | JPL TRS 1992+
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